Die Bedeutung interferometerischer Messtechnik für die MikroOptik

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1 Die Bedeutung interferometerischer Messtechnik für die MikroOptik Reinhard Völkel, Martin Eisner, Kenneth J. Weible SUSS MicroOptics, Neuchâtel Schweiz

2 Warum Johannes ist Messtechnik für die für MikroOptik so so wichtig? ist!! 2

3 1987

4 1987: Der Optische Computer! Am Rechenzentrum der Uni wurden die Lochkarten abgeschafft! Prof. Lohmann fegte jeden vom Tennisplatz! Speckles wurden noch ordentlich maskiert! Willi feierte rauschende Feste am Geisberg! Norbert kam von Bell Labs, Johannes vom ZOS Wirklich prägend für diese Epoche war ein Bild Historisch interessant ist, dass sowohl beim optischen Computer als auch bei diesem Bild wichtige Details übersehen wurden. 4

5 Holographische Linsen in Dichromatgelatine Die Kombination optischer Computer und Holographie war unschlagbar! Historisches Holo-Lab 488 nm 633 nm 5

6 Messtechnik für Holographische Linsen? Wie vermisst man eine holographische Linse? Spot-Diagramm korrigiert nicht korrigiert 6

7 Twyman-Green Interferometer ist bessere Lösung! nicht korrigiert korrigiert 7

8 1992

9 Es gibt keine Messtechnik für Mikrolinsen! 9

10 1994

11 1995: Bill Hugle s Mikrolinsen-Lithographie Patent 1992: Lens Array Lithography Lösungsansatz: +1 Abbildung mit invertiertem Zwischenbild! Bill Hugle 11

12 1995: Bill Hugle s Mikrolinsen-Lithographie OBJ System Aperture IMAG L 1 L 2 h h1 Principle Ray EL 1 EL 2 h 1 Bill Hugle Telescope I Field Aperture Telescope II Fully symmetic system Benfits: no coma, astigmatism telecentric imaging aspheric microlenses 0.8 mm working distance large depth of focus telecentric projection 12

13 Karl Süss Neuchâtel - SUSS MicroOptics 1999 Reinraum für Mikrolinsenproduktion Ø200 mm Wafers (Quarz und Silizium) 2002 Gründung SUSS MicroOptics SUSS RC8, ACS200 SUSS DV13 SUSS KT-22 SUSS MA8 SUSS MA/BA6 SUSS DSM8 STS-ICP TWG-Interferometer MZ-Interferometer Wyko NT3300 Foothill KT-22 13

14 Our Products and Services SUSS MicroOptics is a leading supplier for! Refractive Microlens Arrays! Fiber Collimators and Couplers! Diffusers and Illumination Systems (from DUV to IR)! Ultra-Flat Microlens Imaging Systems SUSS MicroOptics offers! Design of Micro-Optical Elements and Systems! Manufacturing of Customer-Specific Micro-Optics! Wafer-Level Packaging! Testing and Inspection 14

15 Optical Design - Consulting SUSS MicroOptics profits from more than 15 years experience in the design of optical elements (diffractive and refractive) and optical systems. SUSS MicroOptics uses the following design tools! SILVACO Expert, IC Layout Editor (Mask-Layout)! ZEMAX-EE, Optical Design Program! RAYTRACE, Optical Design Program! Simulated Annealing and Iterative Fourier Optimization for DOEs! Rigorous Diffraction Theory for Wave Propagation SUSS MicroOptics works closely with top-ranking research groups worldwide to support our customers in developing and improving their products. 15

16 Refractive Microlens Arrays Standard Specifications! 200 mm wafer size, fused silica and silicon! Lens profiles: spheres, aspheres (k = 0 to -8)! Lens diameter typically 50 µm to 2 mm! Lens sag up to 50 µm! Numerical aperture from 0.02 to 0.8 Optional Features! Double sided arrays! Stop arrays (masking of dead space by absorbing layer)! AR-coating, dicing! Wafer-Level Packaging 16

17 Testing and Inspection Fizeau Interferometer for Wafer Inspection Flatness of wafer surfaces, parallelity front- and backside Foothill Instruments KT-22, Film Thickness Metrology Uniformity of photoresist coatings Phase Shifting Twyman-Green Interferometer (Schwider) Deviation from sphere or asphere, radius of curvature (ROC) Phase Shifting Mach-Zehnder Interferometer (Schwider) Wave aberrations, focal length, NTF, PSF (wavelength 633nm) Wyko NT3300 Surface Profiler, White Light Interferometer Automatic full wafer testing for ROC, profile, surface roughness SUSS MicroTec DSM-8, Double-Side Alignment Test Alignment accuracy of micro-optical structures front/backside, total system 17

18 Mach-Zehnder Interferometer: Strehl 0.99 Tested by Heidi Ottevaere, VUB - Lab for Photonics (TONA-TW),Brussel, BELGIUM 18

19 Illumination Mask Aligner: Flat-Top Diffuser Ellipsoidal mirror Exposure Optics Cold light mirror Condenser lens Shutter Light sensor Mirror Diffraction red. Optics Front Lens Mask & Wafer Far-field intensity (arbitrary units) distribution of aspherical microlens array as forseen for illumination within a Mask Aligner MPL 19

20 Wafer-Level Packaging " Automatic dispensing of UV-curing optical glue on wafer " Precise alignment in x-y-z within SUSS Mask Aligner ( x, y 2 µm, z 5 µm, ϕ < 0.01 ). " UV-exposure within SUSS Mask Aligner " Dicing of complete stack of wafers 20

21 Microlens Projection Lithography Ultra-flat Microlens Projection Module SUSS MA150-MPL Extended Depth of Focus with No Change of Critial Dimensions 21

22 Fiber Coupling! Sender: laser or fiber array! Receiver: detector or fiber array! In-between: MOEMS, lens system, switch! Coupling efficiency up to 100%, no crosstalk! Relaxed tolerances (shift, tilt)! Holes or posts on backside for fiber alignment! Lens arrays, lateral position accuracy < 0.25 µm 22

23 /shop 2003

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